This process monitoring system has been developed for various kinds of applications such as etch, CVD and other reactive gas processes.
Using ULVAC's original ion source and pumping system enables you to achieve stable measurements results.


  • Long term stable measurements results
  • Communication interface Ethernet compatible
  • Closed Ion Source Utilizing a Magnetic Field:
    Soft ionization provides less gas dissociation and higher sensitivity. Decomposition and adsorption due to thermal reactions are minimized in the ionization chamber.
  • Short distance between the process chamber and ion source allows quick-response of analysis.
  • Wide pressure range from 10-6 to 13kPa is available. (Choice of orifices)
  • No need for PC
  • "One Click" function
  • Max 120℃(248℉) High temperature bakeing.
  • Electron bombard degas
  • Protection and maintenance of ion source and secondary electron multiplier
  • Traceability of analysis tube (patent pending)
  • Various Leak Tests are Available (Helium leak test, air leak test, leak up)
  • Capable of total pressure measurement (External ionization gauge GI-M2)
  • This software is included and compatible with (Windows 7/8/10)


  • For etching and CVD process
  • Monitoring reactive gases during process
  • End-point monitoring for etching and cleaning processes
  • Residual gas analyzing
  • Leak testing


Model RGM2-202 RGM2-302
Mass filter type Quadrupole
Mass range 1 to 200 amu 1 to 300 amu
Resolution M/△M=1M (10%P.H.)
Detector type SEM/Faraday cup
Sensitivity 1×10-3 A/Pa
1.33×10⁻¹ Torr
minimum detectable partial pressure

(inside analyzer tube)

1×10-10 Pa
7.5×10-13 Torr
1×10-12 mbar
Ion source Closed ion source utilizing a magnetic field
Filament Ir/Y2O₃ coated V type, 1pc
Ionization voltage 20 to 70 eV
Emission current 10μA
DC amplification range 1×10-5 to 1×10-12 A
Maximum bakeout operating temperature 120℃ (248℉)
Differential pumping system
Gas inlet value Conductance value with 3 different gas inlet modes (VPC-070)
Max. sampling pressure 13kPa
Differential pumping system With intermadiate port and gas purge port
Turbo molecular pump 67L/s:N₂
Fore pump DIS090
Pirani vacuum gauge SW1-1
Ionization vacuum gauge GI-M2
Weight Pumping system:57kg / Controller:38kg
Power supply AC100V 15A
Compressed air Dry N2:0.4 to 0.7MPa (Φ6 one-touch joint)
Dry N2:3×10⁺³ to 5.25×10⁺³ Torr (Φ6 one-touch joint)
Dry N2:4 to 7 mbar (Φ6 one-touch joint)
Control unit
"One Click" function Capable / He/H2O/N2/O2/Any gas
External I/O and other Analog input×2 (0 to 10V)
Set-point output×2 (fault,alarm)
External interlock
Baking heater Tape heater
Stand Standard
Sensor unit (Control box cable) 5m
Interface Ethernet
Software Qulee QCS Ver.4.0 later(Windows 7/8/10)
Option PC