DC Power Supply
DC Power Supply DPG Series
The DPG Series power generators for sputtering. They are made of reliable components and circuits. These highly reliable power generators have been optimized for plasma loads with a design that reflects our many years of knowledge that includes power generator applications.
DC Power Supply DCS Series
As the basic performance is a matter of course, DCS series provides superior cost performance and is used in various applications.
Combination use of the arc suppression unit, A2K, is effective well in reactive sputtering.
Abnormal Discharge Prevention Unit A2K Series
Bipolar unit for dual cathode MFU Series
DC Pulse Power Supply
DC Pulse Power Supply DPG-5P / DPG-10P Series
RF Power Supply / Matching box
RF Power Supply RFS-N Series / Matching Box
RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier. RF power supply has a built-in auto matching controller function, power control of the RF power supply and matching system control can be performed with the main unit alone.
RF Power Supply Option MEX-N Series
This is a switching device for the matching box of the power supply for plasma generation such as RF sputtering, plasma CVD, and etching.
RF Power Supply Option EXN Series
EXN series is a target switcher. It is used to switch power supply destinations to multiple DC sputtering electrodes and RF sputtering electrodes. It also can switch the output of multiple DC and RF power supplies and supply them to one electrode.